|
TMP 2001 |
Specifications: Fully rebuild Leybold Turbovac TMP 340M turbo pump. ISO100/6" CFF, Magnetic Bearing, Water cooling. Pumping speed: N2 - 250 L/S He - 370 L/S H2 - 340 L/S Weight approx.35lbs Typical Applications -Gas analysis systems -Particle accrlerators -Electron beam microscopy -Research instuments and systems Technical Features -Magnetic suspension -Absolutely free of any lubricant -Low noise and vibration levels -Operation in any orientation -Convection cooling -Purge gas design Advantage to the Users -Maintenance-free -Convection cooling -No batteries are required because of integrated generator mode in case of power failures. America One Surplus is a leading supplier of refurbished vacuum pumps. We offer Sales and Service for: - Turbomolecular Pumps - Controllers (frequency converters) - Scroll pumps - Dry (Oil Free) - Rotary Vane (mechanical) pumps - Diffusion, Cryo, Ion, Piston Pumps - Booster Pumps (Blowers) - Leak Detectors. - Our wide access to used vacuum equipment and rebuilding services Provides an additional excellent resource for low-cost solutions. OEM Sales & Service. Warranty on all Pumps, Vacuum equipment, parts and labor. - We Sale & Service: LEYBOLD, ALCATEL, BOC EDWARDS, PFEIFFER, BALZERS, VARIAN, SEIKO SEIKI, STOKES, WELCH, RIGAKU, EBARA, KINNEY, CTI pumps
http://www.absolute-vacuum.com/edwards-turbomolecular-pumps.php
Turbo vacuum pumps: Edwards (formely known as BOC Edwards) turbomolecular vacuum pumps
Edwards EXT turbomolecular pumps and EXC controllers
Our range of EXT turbomolecular and compound molecular pumps and EXC Controllers uses state-of-the-art technology to provide reliable, high and ultra high vacuum.
Key performance factors
A turbomolecular pump (TMP) is a multi-stage axial-flow turbine in which high speed rotating blades provide compression by increasing the probability of gas molecules moving in the pumping direction. The turbomolecular pump is optimized for molecular flow conditions and requires a suitably sized two stage rotary vane pump or an oil free scroll pump to exhaust to atmosphere.
A compound molecular pump (CMP) is based on the concept of combining bladed turbomolecular stages with molecular drag stages on the same rotor. This design allows: •
* High critical foreline pressures (typically up to 10 mbar) •
* Options to use smaller backing pumps or dry diaphragm backing pumps
Pumping speed (volume flow rate) is determined by the rotor diameter, inlet flange size and rotational speed. The pumping speed reduces at high inlet pressures to a value determined by the size of the backing pump.
edwards turbo vacuum pumps (top)
As the inlet pressure rises, the motor power dissipation and pump temperature increase. Maximum continuous inlet pressure sets the maximum throughput limit for steady state pumping and depends on the cooling method used. Above this pressure, the rotational speed of the pump reduces as temperature sensors limit the pump power. With a water-cooled pump, the actual maximum throughput depends on the size of the backing pump.
Quiescent electrical power is the nominal power dissipated by a pump operating normally at full rotational speed and with low gas throughput (inlet pressure below the 10–3 mbar range). During the run-up time, or when operating at high gas throughput or above the critical backing pressure, the pump power dissipation will rise and approach the maximum power output for the EXC Controller used. Critical backing pressure for conventional turbomolecular pumps is approximately 0.1 to 0.2 mbar.
Compression ratio is determined by the rotational speed, the number of pump stages and the molecular weight of the pumped gas. It is higher for heavier gases which explains why the suppression of hydrocarbon backstreaming is so effective and why the ratio for hydrogen is important for ultra high vacuum applications.
Ultimate pressure measured according to Pneurop standards, is the lowest pressure achieved in the test system, 48 hours after bakeout. The system is backed only by a two-stage rotary vane pump. Fluoroelastomer inlet seals are used with ISO-flanged pumps and metal seals are used with CF-flanged pump models.
Bearing and suspension technologies
We use two basic technologies: magnetic bearings and mechanical ceramic ball bearings. Ceramic bearings, which are lubricated for life by either grease or oil, have replaced conventional steel bearings. The silicon nitride ceramic balls are lighter, harder and smoother than steel equivalents, leading to longer life and lower vibration characteristics. Reliability is increased because the ball and race materials are different, which prevents micro pitting. Magnetic bearings further increase reliability. Our EXT turbomolecular pumps up to 540 l s-1 use a hybrid bearing arrangement with a permanent magnet upper bearing and an oil lubricated ceramic lower bearing.
edwards turbo vacuum pumps (top)
Rotor technologies
We use two basic technologies: • conventional full stack turbomolecular (typically 12 stages) • compound molecular (combining turbomolecular and drag stages) In addition, EXT pumps up to 540 l s-1 use monobloc rotors machined from solid bar by computer controlled high speed milling machines. This technology produces stable, rigid rotors and allows virtually unlimited design flexibility for optimum vacuum performance.
Motor technology
EXT pumps use brushless d.c. motors and are available in 24 and 80 volt variants. For the 24 volt pumps the TIC line of controllers are available with the added benefit of integrated instrument controllers. For the 80 volt pumps you can choose from our EXC line of controllers to optimize the performance and cost options for your application. The Controllers incorporate a regenerative back-up supply which provides power in the event of electrical supply failure to keep the ventvalve closed for several minutes.
edwards turbo vacuum pumps (top)
Corrosive applications
For maximum life and reliability in the exacting process conditions encountered in semiconductor wafer processing applications, we recommend that you use turbomolecular pumps from our Edwards STP-C and STPH-C series (see page 2-33). These Maglev pumps have magnetic bearings and are ideal for these harsh duty applications.
Purge port
The EXT pumps all have purge-ports which can be used to purge the motor and bearing cavity with an inert gas (such as nitrogen). We recommend that you purge the pump when you pump corrosive and abrasive gas mixtures or those with an oxygen content over 20%. You can use our PRX10 purge-restrictor to set the purge gas flow rate. This typically adds up to 25 sccm to the total gas load and the backing pump must be sized accordingly.
edwards turbo vacuum pumps (top)
Venting
To maintain the cleanliness of your vacuum system, we recommend that you vent a turbomolecular pump at or above half rotational speed, when the rotor is still spinning fast enough to suppress any backstreaming of hydrocarbons from the backing line.
The vent port on the EXT pump is part way up the rotor stack to ensure maximum cleanliness even with fluoroelastomer sealed vent-valves. Each pump is supplied with a manual vent-valve. If you use this manual valve care must be taken not to open it too quickly, especially if the system volume is small (typically less than the approximate volume of the turbomolecular pump), because if the rate of pressure rise is too high, the pump bearing life may be reduced.
In a small volume system, the rate of pressure rise will be greater than in a large volume for a given vent flow rate, and it may be necessary to restrict the vent gas flow. We offer the VRX range of vent restrictors which you can fit to your EXT pump.
Since the rate of pressure rise cannot be accurately controlled by the manual vent-valve, we recommend that, unless you fit a suitable VRX restrictor to the vent port, you must wait until the turbomolecular pump has slowed down to 50% speed, as indicated by the controller, before you open the manual vent-valve.
The maximum rate of pressure rise varies by pump model, and the Instruction Manual supplied with an EXT pump gives further guidance on this, and the size of vent restrictor needed to meet the fastest pressure rise allowed.
Control of the rate of venting is particularly important with pumps using fully magnetic bearings, otherwise the safety bearings may be damaged.
The manual vent-valve can be replaced with a TAV solenoid valve driven by the EXC Controller to allow venting after a 2 second delay on shut-off, or delaying vent until the rotational speed has dropped to 50%. The EXC Controller can also control the TAV vent-valve in the event of power or pump failure.
You can choose from two solenoid vent-valve options; the TAV5 which covers most auto-venting applications, and the TAV6 which has a higher conductance than the TAV5 and is designed either for use on larger chambers (typically with a volume greater than 10 liters), or when you want to use a two-stage venting procedure for the fastest possible vent times.
For two-stage venting you need two TAV valves. By using the appropriately restricted flow for the first stage vent-valve you can start venting when the EXT pump is still at full rotational speed. Once the pump has slowed to half rotational speed you can then introduce higher flow rates from the second stage vent-valve.
edwards turbo vacuum pumps (top)
Inlet-screen
An inlet-screen is fitted as standard to all EXT pumps. The inlet-screen prevents debris from falling into the pump-inlet. In addition, the inlet-screen prevents you from coming into contact with the blades of the pump when it is disconnected from your vacuum system.
Cooling
For most applications, we recommend that you use forced-air cooling with the appropriate ACX air-cooler connected to your EXT pump. NB: high gas load, high backing pressure and rapid cycling require more cooling. However, if the ambient temperature is above 35 °C you must water-cool the EXT. The barbed connectors on the water-cooler are suitable for 6 mm internal diameter hose. Water cooling reduces the running temperature of the pump motor and bearings and is particularly recommended when you operate the EXT with a continuous high throughput (that is, inlet pressure above 1 x 10-3 mbar) or when you bake the EXT pump to above 70 °C (measured at the inlet flange).
Scope of supply
For end users desiring front panel controls and indications when using an 80 volt pump a minimum operating system requires you to order an EXT pump, an EXC controller and a pump to controller cable. For a 24 volt pump a minimum operating system requires you to order an EXT pump, a TIC controller and an EXDC controller. (The EXDC controller is not required when using an EXT75DX or EXT255DX). Each EXT pump is supplied with an inlet-screen, elastomer inlet seal or copper gasket (as appropriate), manual vent valve and water-cooler. EXT75DX, EXT255DX and EXT556H require a water-cooler accessory in addition (if required). Each EXC/TIC controller is supplied with a 2 m unterminated electrical supply cable.
edwards turbo vacuum pumps (top)
Edwards 3000 vacuum pump
Edwards 1900 vacuum pump
Edwards GV400 vacuum pump
Edwards Blowers (Rootes pumps)
Full parts and spares list
Edwards Blowers (Rootes pumps):
Edwards e2m2 vacuum pump
Edwards e1m5 vacuum pump
Edwards e2m5 vacuum pump
Edwards e1m8 vacuum pump
Edwards e2m8 vacuum pump
Edwards e2m12 vacuum pump
Edwards e1m18 vacuum pump
Edwards e2m18 vacuum pump
Edwards e2m28 vacuum pump
Edwards e2m30 vacuum pump
Edwards e1m40 vacuum pump
Edwards e2m40 vacuum pump
Edwards e1m80 vacuum pump
Edwards e2m80 vacuum pump
Edwards e1m175 vacuum pump
Edwards e2m175 vacuum pump
Edwards e1m275 vacuum pump
Edwards e2m275 vacuum pump
EH250 blower
EH500A blower
EH1200 blower
EH2600 blower
EH4200 blower
Edwards Turbo pumps
Edwards Speedivalves
Edwards Vacuum pumps:
RV3 Vacuum pump
RV5 Vacuum pump
RV8 Vacuum pump
RV12 Vacuum pump
Edwards Hook and claw pumps
Edwards scroll pumps
Edwards GV Series
Edwards GVM Series
Edwards EM Series Oil pumps
Edwards drystar pumps
Edwards vacuum oils:
edwards 8A oil
edwards supergrade A
edwards 17 oil
edwards 20 oil
edwards 16 oil
edwards 18 oil
edwards ultragrade 15
edwards ultragrade 19
edwards ultragrade 20
edwards ultragrade 70
edwards 45 grade oil |
3203 LMC |
Service & Repairs of Turbo pumps and controllers (frequency converters),High Vacuum Pumps (ion,turbo,diffusion,cryo,mechanical,dry,scroll,rotary vane,mechanical boosters) & Leak Detectors.
Alcatel 5011 Alcatel 5030
Alcatel 5080 Alcatel 5100
Alcatel 5150 Alcatel 5150CP
Alcatel 5150CP
Alcatel 5400
Alcatel 5400CP Alcatel 5401
Alcatel 5401CP Alcatel 5402
Alcatel 5402CP Alcatel 5010
ATP 80 ATP 100
ATP 150 ATP 400
,Supplier of Reconditioned vacuum pumps: wet, dry, scroll, rotary, diffusion, mechanical boosters, turbo molecular pumps, ion, cryo.
We buy vacuum pumps,turbo pumps, ion pumps, cryo pumps, diffusion pumps, vane pumps, oil free pumps, dry pumps, mechanical vacuum pumps and Leak Detectors.
Pump,Vacuum,Turbo Pump Repair ,Vacuum Pump Repair,Surplus Vacuum Equipment,Refurbished Vacuum Pumps ,Vacuum Pump Buyers, Buy,Sell,Exchange Vacuum Pumps, Rebuilt Vacuum Pump Supply,High Vacuum pumps, Semiconductor ,Surplus Vacuum Pumps ,Leybold Turbo Pumps , Controllers
ALCATEL Turbo Pump Sales,ALCATEL Turbo Pump Repair ,Alcatel Vacuum Pump Repair,Alcatel Surplus Vacuum Equipment,Alcatel Refurbished Vacuum Pumps ,Alcatel Vacuum Pump Buyers,Alcatel Buy,AlcatelSell,Alcatel Exchange,Alcatel Vacuum Pumps,Alcatel Rebuilt Vacuum Pump Supply,Alcatel High Vacuum pumps,Alcatel Semiconductor ,Alcatel Surplus Vacuum Pumps ,Alcatel,Leybold Turbo Pumps ,Alcatel turbopump Controllers.
EDWARDS Turbo Pump Sales,EDWARDS Turbo Pump Repair ,Edwards Vacuum Pump Repair,Edwards Surplus Vacuum Equipment,Edwards Refurbished Vacuum Pumps ,Edwards Vacuum Pump Buyers,Edwards Buy,Edwards Edwards Sell,Edwards Exchange,Edwards Vacuum Pumps,Edwards Rebuilt Vacuum Pump Supply,Edwards High Vacuum pumps,Boc Edwards Semiconductor ,Edwards Surplus Vacuum Pumps ,Edwards,Edwards turbopump Controllers.
VARIAN Turbo Pump Sales,VARIAN Turbo Pump Repair ,Varian Vacuum Pump Repair,Varian Surplus Vacuum Equipment,Varian Refurbished Vacuum Pumps ,Varian Vacuum Pump Buyers,Varian Buy,Varian Sell,Varian Exchange,Varian Vacuum Pumps,Varian Rebuilt Vacuum Pump Supply,Varian High Vacuum pumps,Varian Semiconductor ,Varian Surplus Vacuum Pumps ,Varian,Varian turbopump Controllers.
PFEIFFER Turbo Pump Sales,PFEIFFER Turbo Pump Repair ,Pfeiffer Vacuum Pump Repair,Pfeiffer Surplus Vacuum Equipment,Pfeiffer Refurbished Vacuum Pumps ,Pfeiffer Vacuum Pump Buyers,Pfeiffer Buy,Pfeiffer Sell,Pfeiffer Exchange,Pfeiffer Vacuum Pumps,Pfeiffer Rebuilt Vacuum Pump Supply,Pfeiffer High Vacuum pumps,Pfeiffer Semiconductor ,Pfeiffer Surplus Vacuum Pumps ,Pfeiffer turbopump Controllers.
BALZERS Turbo Pump Sales ,BALZERS Turbo Pump Repair ,Balzers Vacuum Pump Repair,Balzers Surplus Vacuum Equipment,Balzers Refurbished Vacuum Pumps ,Balzers Vacuum Pump Buyers,Balzers Buy,Balzers Sell,BalzersExchange,Balzers Vacuum Pumps,Balzers Rebuilt Vacuum Pump Supply,Balzers High Vacuum pumps,Balzers Semiconductor ,Balzers Surplus Vacuum Pumps ,Balzers turbopump Controllers.
SEIKO SEIKI Turbo Pump Sales,SEIKO SEIKI Turbo Pump Repair ,Seiko Seiki Vacuum Pump Repair,Seiko Seiki Surplus Vacuum Equipment,Seiko Seiki Refurbished Vacuum Pumps ,Seiko Seiki Vacuum Pump Buyers,Seiko Seiki Buy,Seiko Seiki Sell,Seiko Seiki Exchange,Seiko Seiki Vacuum Pumps,Seiko Seiki Rebuilt Vacuum Pump Supply,Seiko Seiki High Vacuum pumps,Seiko Seiki Semiconductor ,Seiko Seiki Surplus Vacuum Pumps ,Seiko Seiki turbopump Controllers.
LEYBOLD Turbo Pump Sales,LEYBOLD Turbo Pump Repair ,Leybold Vacuum Pump Repair,Leybold Surplus Vacuum Equipment,Leybold Refurbished Vacuum Pumps ,Leybold Vacuum Pump Buyers,Leybold Buy,Leybold Sell,Leybold Exchange,Leybold Vacuum Pumps,Leybold Rebuilt Vacuum Pump Supply,Leybold High Vacuum pumps,Leybold Semiconductor ,Leybold Surplus Vacuum Pumps ,Leybold Turbo Pumps ,Leybold turbopump Controllers.
Pump,Vacuum,Turbo Pump Repair ,Vacuum Pump Repair,Surplus Vacuum Equipment,Refurbished Vacuum Pumps ,Vacuum Pump Buyers, Buy,Sell,Exchange Vacuum Pumps, Rebuilt Vacuum Pump Supply,High Vacuum pumps, Semiconductor ,Surplus Vacuum Pumps ,Leybold Turbo Pumps , Controllers, Edwards pump repair, Balzers Turbo pump repair,Balzers Turbo Pup sales, pfeiffer turbo pump sale, leybold turbo pump sale, alcatel turbo pump sale, seiko seiki turbo pump, balzers turbo pump sale, balzers tph,
Roots Vacuum Pumps ,Turbomolecular Pump, TurboDrag Pump, Surplus Turbo Pumps, Surplus Vacuum Pump, Surplus Dry Pumps , Surplus Turbo Pumps, Surplus Vacuum Pumps, Surplus Dry Pumps, High Vacuum Equipment, Turbo Pump Sale, Turbo Pump, Turbo Pump Packages, Turbo Pumping Station, Dry Pumps, Vacuum Pump Sale, Turbo Pump Sale, Turbo Pump, Turbo Pump Packages, Turbo Pumping Station, Dry Pumps, Vacuum Pump Sale, Turbo Pump Sale, Turbo Pump, Turbo Pump Packages, Turbo Pumping Station, Dry Pumps, Vacuum Pump Sale, Pfeiffer Vacuum, Balzers, Alcatel Leybold, Edwards, Seiko Seiki, Pfeiffer Turbo Pump, Balzers Turbo Pump, Alcatel Turbo Pump, Leybold Turbo Pump Pfeiffer Vacuum, Balzers, Alcatel Leybold, Edwards, Seiko Seiki, Pfeiffer Turbo Pump, Balzers Turbo Pump, Alcatel Turbo Pump, Leybold Turbo Pump Pfeiffer Vacuum, Balzers, Alcatel Leybold, Edwards,
Seiko Seiki, Pfeiffer Turbo Pump, Balzers Turbo Pump, Alcatel Turbo Pump, Leybold Turbo Pump,,,Seiko Seiki, Turbo pump sale, turbo pump sales, used balzers turbo pump, used alcatel turbo pump, used leybold turbo pump, new Pfeiffer vacuum turbo pump, turbo pump sale, vacuum pump sale, dry pump sale, Edwards dry pump sale, Edwards dry pump repair, dry pump repair, leybold, balzers tph 060, balzers tpu 060, balzers tph 240, balzers tpu 240, Pfeiffer tmh 260, Pfeiffer tmu 260, Pfeiffer tmh 520, pffeiffer Tph 520, Pfeiffer TPH 1600, Pfeiffer tmh 1600 PC, Pfeiffer tmh 1600, Pfeiffer tmh 1600 repair, Pfeiffer turbo pumps, Pfeiffer, turbo pump service, turbo pump sale, vacuum pump repair, vacuum pump repair, alcatel vacuum pump repair, Seiko seiki, Pfeiffer tph 2200, Pfeiffer tpu 2200, balzers tph 2200, balzers tpu 2200, Pfeiffer vacuum tph 2101 PC turbo pump.
Turbo Pump Repair, Pfeiffer Balzers turbo Pump, Pump Repair - Vacuum- Pump- Repair, Alcatel, Leybold, Edwards Turbo molecular pumps, Turbo Drag Pumps, Dry Vacuum pumps and Rotary vane pumps, Vacuum Pump, Turbo Pump Repair, Turbo Pump Service, Balzers, Pfeiffer Vacuum, Leybold, Turbomolecular Pump, Vacuum Pump Repair, Turbo Pump, Balzers Turbo Pump, Alcatel Turbo Pump, Balzers Turbo Pump, Pfeiffer Turbo Pump Sale, Pfeiffer Turbo Pump Sale, Pfeiffer Turbo Pump Sale, Leybold Turbo Pump, Seiko Seiki Turbo Pump, Seiko Seiki Turbo Pump, Balzers Turbo Drag, Balzers Pump Repair, Alcatel Pump Repair, Leybold Pump Repair, Dry Pump Repair, Dry Pump Repair, Dry Pump Repair, Edwards Dry Pump, Balzers, Pfeiffer Vacuum, Vacuum Pump Repair, Turbo Pump repair, Leybold Pump repair, Alcatel Pump repair, Edwards pump repair, Balzers Turbo pump repair,
Pfeiffer-Balzers TPH 050, Pfeiffer-Balzers TMU 065, Pfeiffer-Balzers TPH 060, Pfeiffer-Balzers TPH 240, Pfeiffer-Balzers TMH 260, Pfeiffer-Balzers TPU 330, Pfeiffer-Balzers TMH 260SG, Pfeiffer-Balzers TPH 330, Pfeiffer-Balzers TPU 510, Pfeiffer-Balzers TMH 071, Alcatel 5402 CP, Pfeiffer-Balzers TPU 240C, Pfeiffer-Balzers TPH 180, Pfeiffer-Balzers TMH 520, Pfeiffer-Balzers TMH 261, Pfeiffer-Balzers TMU 1000, Pfeiffer-Balzers TMU 1601P, Pfeiffer-Balzers TPH 2101 PC, Seiko Seiki STP 301, balzers tph 2200, pfeiffer tph 2200, pfeiffer balzers tph 2200, balzers tph 2200, leybold Turbovac 1000C, Leybold 1000C, Leybold Turbovac 361, Leybold 361 Turbo pump, turbo pump sales, turbo pump sales, turbo pump sales,
,Used Vacuum Equipment, Rebuilt Vacuum Pumps, Used Mechanical Pumps, Rebuilt Mechanical Pumps, Used Vaccum Pumps, Vacuum Pump Repair, Vacuum Pump Service, Vacuum Pump Rebuilding, Custom Vacuum Chambers, Vacuum Pump Oil, Vacuum Fittings, Rebuilt Vacuum Pumps, Rebuilt Turbomolecular Pumps, Used Turbo Pumps, Used Ion Pump Controllers, Ion Pump Cables, Ion Gauges, Used Ion Gauge Controllers, Ion Gauge Cables, Thermocouple Gauges, Convection Gauges, Capacitance Manometers, Used Vacuum Gate Valves, Used Gate Valves, Used Vacuum Chambers, Used Diffusion Pumps, Rebuilt Diffusion Pump, Used Helium Leak Detectors, Rebuilt Leak Detectors, Helium Leak Detector Repair and Service, and Other Vacuum Equipment repair.
,Pfeiffer-Balzers TPH 050, TCP 121, Pfeiffer Balzers TMU 065, TCP 120, Pfeiffer Balzers TPH 060, TCP121, Pfeiffer Balzers TPH 240, Balzers TCP 310, Pfeiffer Balzers TMH 260, TCP 380, Balzers TPH 330, TCP 300, Pfeiffer-Balzers TMH 260SG, TCP 380, Pfeiffer Balzers TPU330, TPU 330, TCP300, Balzers Pfeiffer TPU-510, TPU 510, TCP 300, Pfeiffer Balzers TPH 180H, TCP 380, Alcatel Turbo Pump 5402, Alcatel Turbo pump 5010, Alcatel 5150,
Pfeiffer - Balzers TMH/U 064, MZ 2, Alcatel Drytel 31, Alcatel Drytel Micro, Turbo Pumping Station,Vacuum pump sale, Edwards vacuum pump, Edwards Dry Pump, Edwards Dry Pump, Edwards QDP 40, Edwards QDP 80,IPX 100 Dry Pump, IPX 100 Dry Pump, IPX Dry Pump, Edwards, IQDP 40 Dry Pump, IQDP 40, IQDP 80, BOC IQDP 80, BOC IQDP 40, Edwards IQDP 80 Dry pump, Edwards IQDP 80, Dry pump sale, dry pump sale, dry pump sale, vacuum pump sale, edwards vacuum pump, edwards vacuum pump, Edwards L70 Dry Pump, Alcatel Dry Pump, Alcatel vacuum pump, alcatel vacuum pump,
Vacuum Pumps, Balzers, Varian, Leybold, Edwards, Alcatel, Used Vacuum Pump, Surplus Vacuum Pump, Rebuilt Vacuum Pump, Vacuum Pump Repair,Seiko Seiki, Turbo pump sale, turbo pump sales, used balzers turbo pump, used alcatel turbo pump, used leybold turbo pump, new Pfeiffer vacuum turbo pump, turbo pump sale, vacuum pump sale, dry pump sale, Edwards dry pump sale, Edwards dry pump repair, dry pump repair, leybold, balzers tph 060, balzers tpu 060, balzers tph 240, balzers tpu 240, Pfeiffer tmh 260, Pfeiffer tmu 260, Pfeiffer tmh 520, pffeiffer Tph 520, Pfeiffer TPH 1600, Pfeiffer tmh 1600 PC, Pfeiffer tmh 1600, Pfeiffer tmh 1600 repair, Pfeiffer turbo pumps, Pfeiffer, turbo pump service, turbo pump sale, vacuum pump repair, vacuum pump repair, alcatel vacuum pump repair, Seiko seiki, Pfeiffer tph 2200,
Pfeiffer tpu 2200, balzers tph 2200, balzers tpu 2200, Pfeiffer vacuum tph 2101 PC turbo pump.
Turbo Turbo Pump Repair, Pfeiffer Balzers turbo Pump, Pump Repair - Vacuum- Pump- Repair, Alcatel, Leybold, Edwards Turbo molecular pumps, Turbo Drag Pumps, Dry Vacuum pumps and Rotary vane pumps, Vacuum Pump, Turbo Pump Repair, Turbo Pump Service, Balzers, Pfeiffer Vacuum, Leybold, Turbomolecular Pump, Vacuum Pump Repair, Turbo Pump, Balzers Turbo Pump, Alcatel Turbo Pump, Balzers Turbo Pump, Pfeiffer Turbo Pump Sale, Pfeiffer Turbo Pump Sale, Pfeiffer Turbo Pump Sale, Leybold Turbo Pump, Seiko Seiki Turbo Pump, Seiko Seiki Turbo Pump, Balzers Turbo Drag, Balzers Pump Repair, Alcatel Pump Repair, Leybold Pump Repair, Dry Pump Repair, Dry Pump Repair, Dry Pump Repair, Edwards Dry Pump, Balzers, Pfeiffer Vacuum, Vacuum Pump Repair, Turbo Pump repair, Leybold Pump repair,
Alcatel Pump repair, |
|
3403 LMTC |
TMH 1001 PCH:
TMH 1001 PCH, Turbomolecular drag pump with TC 600, DN 200 ISO-K
Characteristics: TMH 1001 PCH Pumping speed: for N2 950 l/s, Ultimate pressure with rotary vane pump < 1·10-8 mbar, Ultimate pressure with diaphragm pump < 1·10-8 mbar, Gas throughput for N2 25 mbar l/s, Fore Vacuum max. for N2 6 mbar,Final pressure only attainable with metallic seals on high vacuum flange. Final pressure with elastomer seals (standard) , <10-8. The gas throughput is measured at HV-pressure of 0.1 mbar. Cooling water quantity is measured at max. gas throughput. First fill of Fomblin oil is included. ADDITIONAL REQUIRED BACKING PUMPS FOR CORROSIVE APPLICATIONS ON REQUEST. Turbopump for high gas throughputs with integrated electronic drive unit / Turbo Controller. Highest gas flows for corrosive gases. Diaphragm pumps for small volumes, rotary vane pumps for large volumes.
Flanges: Flange (in): DN 200 ISO-K
Flange (out): DN 40 ISO-KF
TMH 1601 PCH:
TMH 1601 PCH, Turbomolecular drag pump with TC 600, DN 250 ISO-K
Characteristics: TMH 1601 PCH Pumping speed: for N2 1400 l/s, Ultimate pressure with rotary vane pump < 1·10-8 mbar, Ultimate pressure with diaphragm pump < 1·10-8 mbar, Gas throughput for N2 24 mbar l/s, Fore Vacuum max. for N2 4 mbar, Final pressure only attainable with metallic seals on high vacuum flange. Final pressure with elastomer seals (standard) , < 1·10-8 mbar. The gas throughput is measured at HV-pressure of 0.1 mbar. Cooling water quantity is measured at max. gas throughput.
First fill of Fomblin oil is included. ADDITIONAL REQUIRED BACKING PUMPS FOR CORROSIVE APPLICATIONS ON REQUEST. Turbopump for high gas throughputs with integrated electronic drive unit / Turbo Controller. High pumping speed. Highest critical backing pressure: maximum gas flow, even with the smallest backing pump. Low cost of ownership.
Flanges: Flange (in): DN 250 ISO-K
Flange (out): DN 40 ISO-KF
Areas of Applications: - Thin film technology
- Tool coating
- Process technology
- Metallurgy
- Semiconductor technology
- Ion implantation
- Sputtering
- Plasma coating
- Vacuum process technology
- Glass coating
Note: In order to select a suitable backing pump, the turbo pump characteristics and process parameters are to be considered.
Similar Products: Suitable backing pumps:
PKT01350 - MVP 055-3 C, Diaphragm pump, 90-126 / 180-254 V, 50/60 Hz
PKT01450 - MVP 160-3 C, Diaphragm pump, 230 V +/- 10 %, 50/60 Hz
PKT01451 - MVP 160-3 C, Diaphragm pump, 120V + 5% /- 10 %, 60 Hz
Click to enlarge
TMU 1001 PCH:
TMU 1001 PCH, Turbomolecular drag pump with TC 600, DN 200 CF-F
Characteristics: TMU 1001 PCH Pumping speed: for N2 950 l/s, Ultimate pressure with rotary vane pump < 1·10-8 mbar, Ultimate pressure with diaphragm pump < 1·10-8 mbar, Gas throughput for N2 25 mbar l/s, Fore Vacuum max. for N2 6 mbar, Final pressure only attainable with metallic seals on high vacuum flange. Final pressure with elastomer seals (standard) , < 1·10-8 mbar. The gas throughput is measured at HV-pressure of 0.1 mbar. Cooling water quantity is measured at max. gas throughput. First fill of Fomblin oil is included. ADDITIONAL REQUIRED BACKING PUMPS FOR CORROSIVE APPLICATIONS ON REQUEST. Turbopump for high gas throughputs with integrated electronic drive unit / Turbo Controller. Highest gas flows for corrosive gases. The temperature management system prevents the sublimation of substances in the pump.
Flanges: Flange (in): DN 200 CF-F
Flange (out): DN 40 ISO-KF
Areas of Applications: - Thin film technology
- Storage media
- Semiconductor technology
- Defect analysis
- Ion implantation
- Sputtering
- Plasma coating
Note: In order to select a suitable backing pump, the turbo pump characteristics and process parameters are to be considered.
Similar Products: Suitable backing pumps
PKT01350 - MVP 055-3 C, Diaphragm pump, 90-126 / 180-254 V, 50/60 Hz
PKT01450 - MVP 160-3 C, Diaphragm pump, 230 V +/- 10 %, 50/60 Hz
PKT01451 - MVP 160-3 C, Diaphragm pump, 120V + 5% /- 10 %, 60 Hz
TMU 1601 PCH:
TMH 1601 PCH, Turbomolecular drag pump with TC 600, DN 250 CF-F
Characteristics: TMU 1601 PCH Pumping speed: for N2 1400 l/s, Ultimate pressure with rotary vane pump < 1·10-8 mbar, Ultimate pressure with diaphragm pump, < 1·10-8 mbar, Gas throughput for N2 24 mbar l/s, Fore Vacuum max. for N2 4,3 mbar. The gas throughput is measured at HV-pressure of 0.1 mbar. Cooling water quantity is measured at max. gas throughput. First fill of Fomblin oil is included. ADDITIONAL REQUIRED BACKING PUMPS FOR CORROSIVE APPLICATIONS ON REQUEST. Turbopump for high gas throughputs with integrated electronic drive unit / Turbo Controller. High pumping speed. Highest critical backing pressure: maximum gas flow, even with the smallest backing pump Low cost of ownership.
Flanges: Flange (in): DN 250 CF-F
Flange (out): DN 40 ISO-KF
Areas of Applications: - Thin film technology
- Tool coating
- Process technology
- Metallurgy
- Semiconductor technology
- Ion implantation
- Sputtering
- Plasma coating
- Vacuum process technology
- Glass coating
Note: In order to select a suitable backing pump, the turbo pump characteristics and process parameters are to be considered.
Similar Products: Suitable backing pumps:
PKT01350 - MVP 055-3 C, Diaphragm pump, 90-126 / 180-254 V, 50/60 Hz
PKT01450 - MVP 160-3 C, Diaphragm pump, 230 V +/- 10 %, 50/60 Hz
PKT01451 - MVP 160-3 C, Diaphragm pump, 120V + 5% /- 10 %, 60 Hz
Click to enlarge
TPH 2101 PC:
Turbomolecular pump with TC 750 and sealing gas connection, DN 200 ISO-K
Characteristics: TPH 2101 PC Pumping speed: for N2 1400 l/s, Ultimate pressure with rotary vane pump < 1·10-8 mbar, Gas throughput for N2 25 mbar l/s, Fore Vacuum max. for N2 1,5 mbar, Sealing gas connection: yes. The gas throughput is measured at HV-pressure of 0.1 mbar and backing pump DUO 120. Cooling water quantity is measured at max. gas throughput. REQUIRED BACKING PUMPS FOR CORROSIVE APPLICATIONS ON REQUEST. Turbopump for high gas throughputs with integrated electronic drive unit / Turbo Controller. High pumping speed. Maximum operational reliability. Mounts in any orientation. Compact High H2 pumping speed. Low cost of ownership
Flanges: Flange (in): DN 200 ISO-K
Flange (out): DN 40 ISO-KF
Areas of Applications: - Thin film technology
- Tool coating
- Process technology
- Metallurgy
- Semiconductor technology
- Ion implantation
- Sputtering
- Plasma coating
- Vacuum process technology
- Glass coating
Note: In order to select a suitable backing pump, the turbo pump characteristics and process parameters are to be considered.
Similar Products: Suitable backing pumps
PKD26602 - DUO 120, Rotary vane pump, 3-ph Motor, IEC 38, 3TF 230/400 V, 50/60 Hz
PKD26652 - DUO 120, Rotary vane pump, 3 phase, IEC 38, 3TF 208/360 V, 50/60 Hz
PKD45305 - DUO 35, Rotary vane pump, 3 phase, 3 TF 400 V, 50 Hz
PKD45602 - DUO 35, Rotary vane pump, 3 phase, 3TF 230/400 V. 50 Hz, 265/460 V. 60 Hz
PKD45642 - DUO 35, Rotary vane pump, 3 phase, 3 TF 200/346V, 50Hz, 220/380V, 60Hz
PKD46305 - DUO 65, Rotary vane pump, 3 phase 400 V. 50Hz, 460 V. 60Hz
PKD46602 - DUO 65, Rotary vane pump, 3 phase, 3TF 230/400 V. 50 Hz, 265/460 V. 60 Hz
PKD46642 - DUO 65, Rotary vane pump, 3 phase, 3 TF 200/346V, 50 Hz, 220/380V, 60 Hz
PKT11800 - UniDryTM 050-4, for light duty processes, standard motor IP 54, 230/400 V, 50 Hz
PKT11801 - UniDryTM 050-4, for light duty processes, standard motor IP 54, 120/208 V, 60 Hz
PKT11804 - UniDryTM 050-4, for medium duty processes, standard motor IP 54, 230/400 V, 50 Hz
PKT11805 - UniDryTM 050-4, for medium duty processes, standard motor IP 54, 120/208 V, 60 Hz
PKT16919 - OnTool DryPump? P, Compact dry pump, horizontal operation, for harsh duty processes
PKT16920 - OnTool DryPump? P, Compact dry pump, vertical operation, for harsh duty processes
PKT16921 - OnTool DryPump? L, Compact dry pump, horizontal operation, for light duty processes
PKT16922 - OnTool DryPump? L, Compact dry pump, vertical operation, for light duty processes
TPH 2201:
CTPH 2201 C, Turbomolecular pump, HV-flange above, DN 250 ISO-K
Characteristics: TPH 2201 Pumping speed: for N2 2100l/s Ultimate pressure with rotary vane pump < 1·10-8mbar Gas throughput for N2 5mbar l/sFinal pressure only attainable with metallic seals on high vacuum flange. Final pressure with elastomer seals (standard) , <10-8. Cooling water quantity is measured at max. gas throughput.The gas throughputs are valid for 100% speed. Higher gas throughputs with lower speed possible.REQUIRED BACKING PUMPS FOR CORROSIVE APPLICATIONS ON REQUEST. Turbopump for high gas throughputs with integrated electronic drive unit / Turbo Controller. HV-flange above. The work horse of the turbopump industry with the newest drive concept. Proven under the most demanding conditions in semiconductor production.
Flanges: FlangesFlange (in): DN 250 ISO-K
Flange (out): DN 63 ISO-K
Areas of Applications: - Thin film technology
- Tool coating
- Process technology
- Metallurgy
- Semiconductor technology
- Sputtering
- Vacuum process technology
- Glass coating
Note: In order to select a suitable backing pump, the turbo pump characteristics and process parameters are to be considered.
Click to enlarge
TPH 2301 PC:
The 2000 l/s high gas load turbo pump,with TC 750 and sealing gas connection, DN 200 ISO-K
Characteristics: TPH 2301 PC Pumping speed: for N2 1550 l/s, Ultimate pressure with OnTool DryPumpTM < 1·10-8 mbar, Gas throughput at full rotational speed for N2 22 mbar l/s, Gas throughput at 0.1 mbar HV for N2, 34 mbar l/s, Fore Vacuum max. for N2 2 mbar, Sealing gas connection: yes, The gas througput is measured with 120 m3 (70 cfm) backing pump.Cooling water quantity is measured at max. gas throughput.The gas throughput is measured at HV-pressure of 0.1 mbar and backing pump DUO 120.REQUIRED BACKING PUMPS FOR CORROSIVE APPLICATIONS ON REQUEST. Turbopump for high gas throughputs with integrated electronic drive unit / Turbo Controller. Highest compression ratio for light gases combined with high Argon gasload due to advanced rotor design.
Flanges: FlangesFlange (in): DN 200 ISO-K
Flange (out): DN 40 ISO-KF
Areas of Applications: - Thin film technology
- Semiconductor technology
- Vacuum process technology
- Research, Development and Scientific
Note: In order to select a suitable backing pump, the turbo pump characteristics and process parameters are to be considered.
Similar Products: Suitable backing pumps:
PKD26602 - DUO 120, Rotary vane pump, 3-ph Motor, IEC 38, 3TF230/400 V, 50/60 Hz
PKD26652 - DUO 120, Rotary vane pump, 3 phase, IEC 38, 3TF208/360 V, 50/60 Hz
PKD45305 - DUO 35, Rotary vane pump, 3 phase, 3 TF400 V, 50 Hz
PKD45602 - DUO 35, Rotary vane pump, 3 phase, 3TF230/400 V. 50 Hz,265/460 V. 60 Hz
PKD45642 - DUO 35, Rotary vane pump, 3 phase, 3 TF200/346V, 50Hz,220/380V, 60Hz
PKD46305 - DUO 65, Rotary vane pump, 3 phase 400 V. 50Hz,460 V. 60Hz
PKD46602 - DUO 65, Rotary vane pump, 3 phase, 3TF230/400 V. 50 Hz,265/460 V. 60 Hz
PKD46642 - DUO 65, Rotary vane pump, 3 phase, 3 TF200/346V, 50 Hz, 220/380V, 60 Hz
PKT11800 - UniDryTM 050-4, for light duty processes, standard motor IP 54, 230/400 V, 50 Hz
PKT11801 - UniDryTM 050-4, for light duty processes, standard motor IP 54, 120/208 V, 60 Hz
PKT11804 - UniDryTM 050-4, for medium duty processes, standard motor IP 54, 230/400 V, 50 Hz
PKT11805 - UniDryTM 050-4, for medium duty processes, standard motor IP 54, 120/208 V, 60 Hz
PKT16919 - OnTool DryPump? P, Compact dry pump, horizontal operation, for harsh duty processes
PKT16920 - OnTool DryPump? P, Compact dry pump, vertical operation, for harsh duty processes
PKT16921 - OnTool DryPump? L, Compact dry pump, horizontal operation, for light duty processes
PKT16922 - OnTool DryPump? L, Compact dry pump, vertical operation,
TPH 261 PC:
TPH 261 PC, Turbomolecular pump with TC 600, DN 100 ISO-K
Characteristics: TPH 261 PC Pumping speed: for N2 175 l/s, Ultimate pressure with rotary vane pump < 1·10-8 mbar, Gas throughput for N2 3 mbar l/s, The gas throughput is measured at HV-pressure of 0.1 mbar and with sealing gas. Cooling water quantity is measured at max. gas throughput.First fill of Fomblin oil is included.REQUIRED BACKING PUMPS FOR CORROSIVE APPLICATIONS ON REQUEST. Turbopump for high gas throughputs with integrated electronic drive unit / Turbo Controller. Highest gas flows for corrosive gases. Rotary vane pumps for large volumes.
Flanges: FlangesFlange (in): DN 100 ISO-K
Flange (out): DN 25 ISO-KF
Areas of Applications: - Thin film technology
- Storage media
- Analytical
- Gas analysis
- Semiconductor technology
- Defect analysis
- Ion implantation
- Plasma coating
Note: In order to select a suitable backing pump, the turbo pump characteristics and process parameters are to be considered.
TPH 521 PC:
TPH 521 PC, Turbomolecular pump with TC 600, DN 160 ISO-K
Characteristics: TPH 521 PC Pumping speed: for N2 430 l/s, Ultimate pressure with rotary vane pump < 1·10-8 mbar, Gas throughput for N2 8 mbar l/s, The gas throughput is measured at HV-pressure of 0.1 mbar and with sealing gas. Cooling water quantity is measured at max. gas throughput. First fill of Fomblin oil is included. REQUIRED BACKING PUMPS FOR CORROSIVE APPLICATIONS ON REQUEST. Turbopump for high gas throughputs with integrated electronic drive unit / Turbo Controller. Highest gas flows for corrosive gases. Maximizes up-time and reliability in typical applications in the semiconductor and coating technology industries.
Flanges: FlangesFlange (in): DN 160 ISO-K
Flange (out): DN 25 ISO-K
Areas of Applications: - Thin film technology
- Storage media
- Semiconductor technology
- Defect analysis
- Ion implantation
- Sputtering
- Plasma coating
Note: In order to select a suitable backing pump, the turbo pump characteristics and process parameters are to be considered.
Click to enlarge
TPH 2301 P:
The 2000 l/s high gas load turbo pump, with TC 750 and sealing gas connection, DN 250 ISO-K
Characteristics: TPH 2301 P Pumping speed: for N2 1900 l/s, Ultimate pressure with OnTool DryPumpTM < 1·10-8 mbar, Gas throughput at full rotational speed for N2 22 mbar l/s, Gas throughput at 0.1 mbar HV for N2 34 mbar l/s, Fore Vacuum max. for N2 2 mbar, Sealing gas connection: yes, The gas througput is measured with 120 m3 (70 cfm) backing pump. Cooling water quantity is measured at max. gas throughput. High compression ratios and improved critical backing pressures for greater economies in fore vacuum. Highest compression ratio for light gases combined with high Argon gasload due to advanced rotor design.
Flanges: Flange (in): DN 250 ISO-K
Flange (out): DN 40 ISO-KF
Areas of Applications: - Thin film technology
- Semiconductor technology
- Vacuum process technology
- Research, Development and Scientific
Note: In order to select a suitable backing pump, the turbo pump characteristics and process parameters are to be considered.
Similar Products: Suitable backing pumps:
PKD26602 - DUO 120, Rotary vane pump, 3-ph Motor, IEC 38, 3TF 230/400 V, 50/60 Hz
PKD26652 - DUO 120, Rotary vane pump, 3 phase, IEC 38, 3TF 208/360 V, 50/60 Hz
PKD45305 - DUO 35, Rotary vane pump, 3 phase, 3 TF 400 V, 50 Hz
PKD45602 - DUO 35, Rotary vane pump, 3 phase, 3TF 230/400 V. 50 Hz, 265/460 V. 60 Hz
PKD45642 - DUO 35, Rotary vane pump, 3 phase, 3 TF 200/346V, 50Hz, 220/380V, 60Hz
PKD46305 - DUO 65, Rotary vane pump, 3 phase 400 V. 50Hz, 460 V. 60Hz
PKD46602 - DUO 65, Rotary vane pump, 3 phase, 3TF 230/400 V. 50 Hz, 265/460 V. 60 Hz
PKD46642 - DUO 65, Rotary vane pump, 3 phase, 3 TF 200/346V, 50 Hz, 220/380V, 60 Hz
PKT11800 - UniDryTM 050-4, for light duty processes, standard motor IP 54, 230/400 V, 50 Hz
PKT11801 - UniDryTM 050-4, for light duty processes, standard motor IP 54, 120/208 V, 60 Hz
PKT11804 - UniDryTM 050-4, for medium duty processes, standard motor IP 54, 230/400 V, 50 Hz
PKT11805 - UniDryTM 050-4, for medium duty processes, standard motor IP 54, 120/208 V, 60 Hz
PKT16919 - OnTool DryPump? P, Corrosive dry pump, horizontal operation, for harsh duty processes
PKT16920 - OnTool DryPump? P, Corrosive dry pump, vertical operation, for harsh duty processes
PKT16921 - OnTool DryPump? L, Corrosive dry pump, horizontal operation, for light duty processes
PKT16922 - OnTool DryPump? L, Corrosive dry pump, vertical operation, for light duty processes
Click to enlarge
TMH 1000 MPCT:
TTMH 1000 MPCT, Turbomolecular drag pump, with TMS, DN 200 ISO-K
Characteristics: TMH 1000 MPCT umping speed: for N2 990 l/s, Utimate pressure with rotary vane pump < 5·10-10 mbar, Ultimate pressure with diaphragm pump < 1·10-8 mbar, Gas throughput for N2 20 mbar l/s, Temperature Management System (TMS): yes, Venting valve integrated, Final pressure only attainable with metallic seals on high vacuum flange. Final pressure with elastomer seals (standard), < 1·10-8 mbar. The gas throughput is measured at HV-pressure of 0.1 mbar. Cooling water quantity is measured at max. gas throughput. Vacuum is about 10% lower by oprating TMS. REQUIRED BACKING PUMPS FOR CORROSIVE GASES ACCORDING TO APPLICATIONS ON REQUEST. Turbopump with high gas throughputs at economical fore-vacuum. Magnetic bearing turbomolecular pumps for corrosive gas operation offers hydrocarbon and maintenance-free operation with unlimited installation orientation. High gas throughput even with small backing pump volume flow rates.
Flanges: FlangesFlange (in): DN 200 ISO-K
Flange (out): DN 40 ISO-KF
Areas of Applications: - Thin film technology
- Tool coating
- Optical coatings
- Semiconductor technology
- Defect analysis
- Ion implantation
- Sputtering
- Plasma coating
- Vacuum process technology
- Research, Development and Scientific
- Plasma physics
Similar Products: Suitable backing pumps:
PKD45602 - DUO 35, Rotary vane pump, 3 phase, 3TF230/400 V. 50 Hz,265/460 V. 60 Hz
PKD45642 - DUO 35, Rotary vane pump, 3 phase, 3 TF200/346V, 50Hz,220/380V, 60Hz
PKT01300 - MVP 055-3, Diaphragm pump, 90-126 / 180-254 V, 50/60 Hz
PKT10800 - UniDryTM 050-3, for light duty processes, standard motor IP 54, 230/400 V, 50 Hz
PKT10801 - UniDryTM 050-3, for light duty processes, standard motor IP 54, 120/208 V, 60 Hz
Click to enlarge
TMH 1600 MPCH:
TMH 1600 MPCH, Turbomolecular drag pump, DN 250 ISO-K
Characteristics: TMH 1600 MPCH Pumping speed: for N2 1400 l/s, Ultimate pressure with rotary vane pump < 1·10-8 mbar, Gas throughput for N2 20 mbar l/s Temperature Management System (TMS) no, Venting valve integrated, Final pressure only attainable with metallic seals on high vacuum flange. Final pressure with elastomer seals (standard), < 1·10-8 mbar. The gas throughput is measured at HV-pressure of 0.1 mbar. Cooling water quantity is measured at max. gas throughput. REQUIRED BACKING PUMPS FOR CORROSIVE GASES ACCORDING TO APPLICATIONS ON REQUEST. Turbopump with high gas throughputs at economical fore-vacuum. Magnetic bearing turbomolecular pumps for corrosive gas operation offers hydrocarbon and maintenance-free operations with unlimited installation orientation. High gas throughput even with smallest backing pump volume flow rates.
Flanges: FlangesFlange (in): DN 250 ISO-K
Flange (out): DN 40 ISO-KF
Areas of Applications: - Thin film technology
- Tool coating
- Optical coatings
- Semiconductor technology
- Defect analysis
- Ion implantation
- Sputtering
- Plasma coating
- Vacuum process technology
- Research, Development and Scientific
- Plasma physics
Similar Products: Suitable backing pumps:
PKD45602 - DUO 35, Rotary vane pump, 3 phase, 3TF230/400 V. 50 Hz,265/460 V. 60 Hz
PKD45642 - DUO 35, Rotary vane pump, 3 phase, 3 TF200/346V, 50Hz,220/380V, 60Hz
PKT10800 - UniDryTM 050-3, for light duty processes, standard motor IP 54, 230/400 V, 50 Hz
PKT10801 - UniDryTM 050-3, for light duty processes, standard motor IP 54, 120/208 V, 60 Hz
PKT10804 - UniDryTM 050-3, for medium duty processes, standard motor IP 54, 230/400 V, 50 Hz
PKT10805 - UniDryTM 050-3, for medium duty processes, standard motor IP 54, 120/208 V, 60 Hz |
3403 LMC |
TMH 1001 PCH:
TMH 1001 PCH, Turbomolecular drag pump with TC 600, DN 200 ISO-K
Characteristics: TMH 1001 PCH Pumping speed: for N2 950 l/s, Ultimate pressure with rotary vane pump < 1·10-8 mbar, Ultimate pressure with diaphragm pump < 1·10-8 mbar, Gas throughput for N2 25 mbar l/s, Fore Vacuum max. for N2 6 mbar,Final pressure only attainable with metallic seals on high vacuum flange. Final pressure with elastomer seals (standard) , <10-8. The gas throughput is measured at HV-pressure of 0.1 mbar. Cooling water quantity is measured at max. gas throughput. First fill of Fomblin oil is included. ADDITIONAL REQUIRED BACKING PUMPS FOR CORROSIVE APPLICATIONS ON REQUEST. Turbopump for high gas throughputs with integrated electronic drive unit / Turbo Controller. Highest gas flows for corrosive gases. Diaphragm pumps for small volumes, rotary vane pumps for large volumes.
Flanges: Flange (in): DN 200 ISO-K
Flange (out): DN 40 ISO-KF
TMH 1601 PCH:
TMH 1601 PCH, Turbomolecular drag pump with TC 600, DN 250 ISO-K
Characteristics: TMH 1601 PCH Pumping speed: for N2 1400 l/s, Ultimate pressure with rotary vane pump < 1·10-8 mbar, Ultimate pressure with diaphragm pump < 1·10-8 mbar, Gas throughput for N2 24 mbar l/s, Fore Vacuum max. for N2 4 mbar, Final pressure only attainable with metallic seals on high vacuum flange. Final pressure with elastomer seals (standard) , < 1·10-8 mbar. The gas throughput is measured at HV-pressure of 0.1 mbar. Cooling water quantity is measured at max. gas throughput.
First fill of Fomblin oil is included. ADDITIONAL REQUIRED BACKING PUMPS FOR CORROSIVE APPLICATIONS ON REQUEST. Turbopump for high gas throughputs with integrated electronic drive unit / Turbo Controller. High pumping speed. Highest critical backing pressure: maximum gas flow, even with the smallest backing pump. Low cost of ownership.
Flanges: Flange (in): DN 250 ISO-K
Flange (out): DN 40 ISO-KF
Areas of Applications: - Thin film technology
- Tool coating
- Process technology
- Metallurgy
- Semiconductor technology
- Ion implantation
- Sputtering
- Plasma coating
- Vacuum process technology
- Glass coating
Note: In order to select a suitable backing pump, the turbo pump characteristics and process parameters are to be considered.
Similar Products: Suitable backing pumps:
PKT01350 - MVP 055-3 C, Diaphragm pump, 90-126 / 180-254 V, 50/60 Hz
PKT01450 - MVP 160-3 C, Diaphragm pump, 230 V +/- 10 %, 50/60 Hz
PKT01451 - MVP 160-3 C, Diaphragm pump, 120V + 5% /- 10 %, 60 Hz
Click to enlarge
TMU 1001 PCH:
TMU 1001 PCH, Turbomolecular drag pump with TC 600, DN 200 CF-F
Characteristics: TMU 1001 PCH Pumping speed: for N2 950 l/s, Ultimate pressure with rotary vane pump < 1·10-8 mbar, Ultimate pressure with diaphragm pump < 1·10-8 mbar, Gas throughput for N2 25 mbar l/s, Fore Vacuum max. for N2 6 mbar, Final pressure only attainable with metallic seals on high vacuum flange. Final pressure with elastomer seals (standard) , < 1·10-8 mbar. The gas throughput is measured at HV-pressure of 0.1 mbar. Cooling water quantity is measured at max. gas throughput. First fill of Fomblin oil is included. ADDITIONAL REQUIRED BACKING PUMPS FOR CORROSIVE APPLICATIONS ON REQUEST. Turbopump for high gas throughputs with integrated electronic drive unit / Turbo Controller. Highest gas flows for corrosive gases. The temperature management system prevents the sublimation of substances in the pump.
Flanges: Flange (in): DN 200 CF-F
Flange (out): DN 40 ISO-KF
Areas of Applications: - Thin film technology
- Storage media
- Semiconductor technology
- Defect analysis
- Ion implantation
- Sputtering
- Plasma coating
Note: In order to select a suitable backing pump, the turbo pump characteristics and process parameters are to be considered.
Similar Products: Suitable backing pumps
PKT01350 - MVP 055-3 C, Diaphragm pump, 90-126 / 180-254 V, 50/60 Hz
PKT01450 - MVP 160-3 C, Diaphragm pump, 230 V +/- 10 %, 50/60 Hz
PKT01451 - MVP 160-3 C, Diaphragm pump, 120V + 5% /- 10 %, 60 Hz
TMU 1601 PCH:
TMH 1601 PCH, Turbomolecular drag pump with TC 600, DN 250 CF-F
Characteristics: TMU 1601 PCH Pumping speed: for N2 1400 l/s, Ultimate pressure with rotary vane pump < 1·10-8 mbar, Ultimate pressure with diaphragm pump, < 1·10-8 mbar, Gas throughput for N2 24 mbar l/s, Fore Vacuum max. for N2 4,3 mbar. The gas throughput is measured at HV-pressure of 0.1 mbar. Cooling water quantity is measured at max. gas throughput. First fill of Fomblin oil is included. ADDITIONAL REQUIRED BACKING PUMPS FOR CORROSIVE APPLICATIONS ON REQUEST. Turbopump for high gas throughputs with integrated electronic drive unit / Turbo Controller. High pumping speed. Highest critical backing pressure: maximum gas flow, even with the smallest backing pump Low cost of ownership.
Flanges: Flange (in): DN 250 CF-F
Flange (out): DN 40 ISO-KF
Areas of Applications: - Thin film technology
- Tool coating
- Process technology
- Metallurgy
- Semiconductor technology
- Ion implantation
- Sputtering
- Plasma coating
- Vacuum process technology
- Glass coating
Note: In order to select a suitable backing pump, the turbo pump characteristics and process parameters are to be considered.
Similar Products: Suitable backing pumps:
PKT01350 - MVP 055-3 C, Diaphragm pump, 90-126 / 180-254 V, 50/60 Hz
PKT01450 - MVP 160-3 C, Diaphragm pump, 230 V +/- 10 %, 50/60 Hz
PKT01451 - MVP 160-3 C, Diaphragm pump, 120V + 5% /- 10 %, 60 Hz
Click to enlarge
TPH 2101 PC:
Turbomolecular pump with TC 750 and sealing gas connection, DN 200 ISO-K
Characteristics: TPH 2101 PC Pumping speed: for N2 1400 l/s, Ultimate pressure with rotary vane pump < 1·10-8 mbar, Gas throughput for N2 25 mbar l/s, Fore Vacuum max. for N2 1,5 mbar, Sealing gas connection: yes. The gas throughput is measured at HV-pressure of 0.1 mbar and backing pump DUO 120. Cooling water quantity is measured at max. gas throughput. REQUIRED BACKING PUMPS FOR CORROSIVE APPLICATIONS ON REQUEST. Turbopump for high gas throughputs with integrated electronic drive unit / Turbo Controller. High pumping speed. Maximum operational reliability. Mounts in any orientation. Compact High H2 pumping speed. Low cost of ownership
Flanges: Flange (in): DN 200 ISO-K
Flange (out): DN 40 ISO-KF
Areas of Applications: - Thin film technology
- Tool coating
- Process technology
- Metallurgy
- Semiconductor technology
- Ion implantation
- Sputtering
- Plasma coating
- Vacuum process technology
- Glass coating
Note: In order to select a suitable backing pump, the turbo pump characteristics and process parameters are to be considered.
Similar Products: Suitable backing pumps
PKD26602 - DUO 120, Rotary vane pump, 3-ph Motor, IEC 38, 3TF 230/400 V, 50/60 Hz
PKD26652 - DUO 120, Rotary vane pump, 3 phase, IEC 38, 3TF 208/360 V, 50/60 Hz
PKD45305 - DUO 35, Rotary vane pump, 3 phase, 3 TF 400 V, 50 Hz
PKD45602 - DUO 35, Rotary vane pump, 3 phase, 3TF 230/400 V. 50 Hz, 265/460 V. 60 Hz
PKD45642 - DUO 35, Rotary vane pump, 3 phase, 3 TF 200/346V, 50Hz, 220/380V, 60Hz
PKD46305 - DUO 65, Rotary vane pump, 3 phase 400 V. 50Hz, 460 V. 60Hz
PKD46602 - DUO 65, Rotary vane pump, 3 phase, 3TF 230/400 V. 50 Hz, 265/460 V. 60 Hz
PKD46642 - DUO 65, Rotary vane pump, 3 phase, 3 TF 200/346V, 50 Hz, 220/380V, 60 Hz
PKT11800 - UniDryTM 050-4, for light duty processes, standard motor IP 54, 230/400 V, 50 Hz
PKT11801 - UniDryTM 050-4, for light duty processes, standard motor IP 54, 120/208 V, 60 Hz
PKT11804 - UniDryTM 050-4, for medium duty processes, standard motor IP 54, 230/400 V, 50 Hz
PKT11805 - UniDryTM 050-4, for medium duty processes, standard motor IP 54, 120/208 V, 60 Hz
PKT16919 - OnTool DryPump? P, Compact dry pump, horizontal operation, for harsh duty processes
PKT16920 - OnTool DryPump? P, Compact dry pump, vertical operation, for harsh duty processes
PKT16921 - OnTool DryPump? L, Compact dry pump, horizontal operation, for light duty processes
PKT16922 - OnTool DryPump? L, Compact dry pump, vertical operation, for light duty processes
TPH 2201:
CTPH 2201 C, Turbomolecular pump, HV-flange above, DN 250 ISO-K
Characteristics: TPH 2201 Pumping speed: for N2 2100l/s Ultimate pressure with rotary vane pump < 1·10-8mbar Gas throughput for N2 5mbar l/sFinal pressure only attainable with metallic seals on high vacuum flange. Final pressure with elastomer seals (standard) , <10-8. Cooling water quantity is measured at max. gas throughput.The gas throughputs are valid for 100% speed. Higher gas throughputs with lower speed possible.REQUIRED BACKING PUMPS FOR CORROSIVE APPLICATIONS ON REQUEST. Turbopump for high gas throughputs with integrated electronic drive unit / Turbo Controller. HV-flange above. The work horse of the turbopump industry with the newest drive concept. Proven under the most demanding conditions in semiconductor production.
Flanges: FlangesFlange (in): DN 250 ISO-K
Flange (out): DN 63 ISO-K
Areas of Applications: - Thin film technology
- Tool coating
- Process technology
- Metallurgy
- Semiconductor technology
- Sputtering
- Vacuum process technology
- Glass coating
Note: In order to select a suitable backing pump, the turbo pump characteristics and process parameters are to be considered.
Click to enlarge
TPH 2301 PC:
The 2000 l/s high gas load turbo pump,with TC 750 and sealing gas connection, DN 200 ISO-K
Characteristics: TPH 2301 PC Pumping speed: for N2 1550 l/s, Ultimate pressure with OnTool DryPumpTM < 1·10-8 mbar, Gas throughput at full rotational speed for N2 22 mbar l/s, Gas throughput at 0.1 mbar HV for N2, 34 mbar l/s, Fore Vacuum max. for N2 2 mbar, Sealing gas connection: yes, The gas througput is measured with 120 m3 (70 cfm) backing pump.Cooling water quantity is measured at max. gas throughput.The gas throughput is measured at HV-pressure of 0.1 mbar and backing pump DUO 120.REQUIRED BACKING PUMPS FOR CORROSIVE APPLICATIONS ON REQUEST. Turbopump for high gas throughputs with integrated electronic drive unit / Turbo Controller. Highest compression ratio for light gases combined with high Argon gasload due to advanced rotor design.
Flanges: FlangesFlange (in): DN 200 ISO-K
Flange (out): DN 40 ISO-KF
Areas of Applications: - Thin film technology
- Semiconductor technology
- Vacuum process technology
- Research, Development and Scientific
Note: In order to select a suitable backing pump, the turbo pump characteristics and process parameters are to be considered.
Similar Products: Suitable backing pumps:
PKD26602 - DUO 120, Rotary vane pump, 3-ph Motor, IEC 38, 3TF230/400 V, 50/60 Hz
PKD26652 - DUO 120, Rotary vane pump, 3 phase, IEC 38, 3TF208/360 V, 50/60 Hz
PKD45305 - DUO 35, Rotary vane pump, 3 phase, 3 TF400 V, 50 Hz
PKD45602 - DUO 35, Rotary vane pump, 3 phase, 3TF230/400 V. 50 Hz,265/460 V. 60 Hz
PKD45642 - DUO 35, Rotary vane pump, 3 phase, 3 TF200/346V, 50Hz,220/380V, 60Hz
PKD46305 - DUO 65, Rotary vane pump, 3 phase 400 V. 50Hz,460 V. 60Hz
PKD46602 - DUO 65, Rotary vane pump, 3 phase, 3TF230/400 V. 50 Hz,265/460 V. 60 Hz
PKD46642 - DUO 65, Rotary vane pump, 3 phase, 3 TF200/346V, 50 Hz, 220/380V, 60 Hz
PKT11800 - UniDryTM 050-4, for light duty processes, standard motor IP 54, 230/400 V, 50 Hz
PKT11801 - UniDryTM 050-4, for light duty processes, standard motor IP 54, 120/208 V, 60 Hz
PKT11804 - UniDryTM 050-4, for medium duty processes, standard motor IP 54, 230/400 V, 50 Hz
PKT11805 - UniDryTM 050-4, for medium duty processes, standard motor IP 54, 120/208 V, 60 Hz
PKT16919 - OnTool DryPump? P, Compact dry pump, horizontal operation, for harsh duty processes
PKT16920 - OnTool DryPump? P, Compact dry pump, vertical operation, for harsh duty processes
PKT16921 - OnTool DryPump? L, Compact dry pump, horizontal operation, for light duty processes
PKT16922 - OnTool DryPump? L, Compact dry pump, vertical operation,
TPH 261 PC:
TPH 261 PC, Turbomolecular pump with TC 600, DN 100 ISO-K
Characteristics: TPH 261 PC Pumping speed: for N2 175 l/s, Ultimate pressure with rotary vane pump < 1·10-8 mbar, Gas throughput for N2 3 mbar l/s, The gas throughput is measured at HV-pressure of 0.1 mbar and with sealing gas. Cooling water quantity is measured at max. gas throughput.First fill of Fomblin oil is included.REQUIRED BACKING PUMPS FOR CORROSIVE APPLICATIONS ON REQUEST. Turbopump for high gas throughputs with integrated electronic drive unit / Turbo Controller. Highest gas flows for corrosive gases. Rotary vane pumps for large volumes.
Flanges: FlangesFlange (in): DN 100 ISO-K
Flange (out): DN 25 ISO-KF
Areas of Applications: - Thin film technology
- Storage media
- Analytical
- Gas analysis
- Semiconductor technology
- Defect analysis
- Ion implantation
- Plasma coating
Note: In order to select a suitable backing pump, the turbo pump characteristics and process parameters are to be considered.
TPH 521 PC:
TPH 521 PC, Turbomolecular pump with TC 600, DN 160 ISO-K
Characteristics: TPH 521 PC Pumping speed: for N2 430 l/s, Ultimate pressure with rotary vane pump < 1·10-8 mbar, Gas throughput for N2 8 mbar l/s, The gas throughput is measured at HV-pressure of 0.1 mbar and with sealing gas. Cooling water quantity is measured at max. gas throughput. First fill of Fomblin oil is included. REQUIRED BACKING PUMPS FOR CORROSIVE APPLICATIONS ON REQUEST. Turbopump for high gas throughputs with integrated electronic drive unit / Turbo Controller. Highest gas flows for corrosive gases. Maximizes up-time and reliability in typical applications in the semiconductor and coating technology industries.
Flanges: FlangesFlange (in): DN 160 ISO-K
Flange (out): DN 25 ISO-K
Areas of Applications: - Thin film technology
- Storage media
- Semiconductor technology
- Defect analysis
- Ion implantation
- Sputtering
- Plasma coating
Note: In order to select a suitable backing pump, the turbo pump characteristics and process parameters are to be considered.
Click to enlarge
TPH 2301 P:
The 2000 l/s high gas load turbo pump, with TC 750 and sealing gas connection, DN 250 ISO-K
Characteristics: TPH 2301 P Pumping speed: for N2 1900 l/s, Ultimate pressure with OnTool DryPumpTM < 1·10-8 mbar, Gas throughput at full rotational speed for N2 22 mbar l/s, Gas throughput at 0.1 mbar HV for N2 34 mbar l/s, Fore Vacuum max. for N2 2 mbar, Sealing gas connection: yes, The gas througput is measured with 120 m3 (70 cfm) backing pump. Cooling water quantity is measured at max. gas throughput. High compression ratios and improved critical backing pressures for greater economies in fore vacuum. Highest compression ratio for light gases combined with high Argon gasload due to advanced rotor design.
Flanges: Flange (in): DN 250 ISO-K
Flange (out): DN 40 ISO-KF
Areas of Applications: - Thin film technology
- Semiconductor technology
- Vacuum process technology
- Research, Development and Scientific
Note: In order to select a suitable backing pump, the turbo pump characteristics and process parameters are to be considered.
Similar Products: Suitable backing pumps:
PKD26602 - DUO 120, Rotary vane pump, 3-ph Motor, IEC 38, 3TF 230/400 V, 50/60 Hz
PKD26652 - DUO 120, Rotary vane pump, 3 phase, IEC 38, 3TF 208/360 V, 50/60 Hz
PKD45305 - DUO 35, Rotary vane pump, 3 phase, 3 TF 400 V, 50 Hz
PKD45602 - DUO 35, Rotary vane pump, 3 phase, 3TF 230/400 V. 50 Hz, 265/460 V. 60 Hz
PKD45642 - DUO 35, Rotary vane pump, 3 phase, 3 TF 200/346V, 50Hz, 220/380V, 60Hz
PKD46305 - DUO 65, Rotary vane pump, 3 phase 400 V. 50Hz, 460 V. 60Hz
PKD46602 - DUO 65, Rotary vane pump, 3 phase, 3TF 230/400 V. 50 Hz, 265/460 V. 60 Hz
PKD46642 - DUO 65, Rotary vane pump, 3 phase, 3 TF 200/346V, 50 Hz, 220/380V, 60 Hz
PKT11800 - UniDryTM 050-4, for light duty processes, standard motor IP 54, 230/400 V, 50 Hz
PKT11801 - UniDryTM 050-4, for light duty processes, standard motor IP 54, 120/208 V, 60 Hz
PKT11804 - UniDryTM 050-4, for medium duty processes, standard motor IP 54, 230/400 V, 50 Hz
PKT11805 - UniDryTM 050-4, for medium duty processes, standard motor IP 54, 120/208 V, 60 Hz
PKT16919 - OnTool DryPump? P, Corrosive dry pump, horizontal operation, for harsh duty processes
PKT16920 - OnTool DryPump? P, Corrosive dry pump, vertical operation, for harsh duty processes
PKT16921 - OnTool DryPump? L, Corrosive dry pump, horizontal operation, for light duty processes
PKT16922 - OnTool DryPump? L, Corrosive dry pump, vertical operation, for light duty processes
Click to enlarge
TMH 1000 MPCT:
TTMH 1000 MPCT, Turbomolecular drag pump, with TMS, DN 200 ISO-K
Characteristics: TMH 1000 MPCT umping speed: for N2 990 l/s, Utimate pressure with rotary vane pump < 5·10-10 mbar, Ultimate pressure with diaphragm pump < 1·10-8 mbar, Gas throughput for N2 20 mbar l/s, Temperature Management System (TMS): yes, Venting valve integrated, Final pressure only attainable with metallic seals on high vacuum flange. Final pressure with elastomer seals (standard), < 1·10-8 mbar. The gas throughput is measured at HV-pressure of 0.1 mbar. Cooling water quantity is measured at max. gas throughput. Vacuum is about 10% lower by oprating TMS. REQUIRED BACKING PUMPS FOR CORROSIVE GASES ACCORDING TO APPLICATIONS ON REQUEST. Turbopump with high gas throughputs at economical fore-vacuum. Magnetic bearing turbomolecular pumps for corrosive gas operation offers hydrocarbon and maintenance-free operation with unlimited installation orientation. High gas throughput even with small backing pump volume flow rates.
Flanges: FlangesFlange (in): DN 200 ISO-K
Flange (out): DN 40 ISO-KF
Areas of Applications: - Thin film technology
- Tool coating
- Optical coatings
- Semiconductor technology
- Defect analysis
- Ion implantation
- Sputtering
- Plasma coating
- Vacuum process technology
- Research, Development and Scientific
- Plasma physics
Similar Products: Suitable backing pumps:
PKD45602 - DUO 35, Rotary vane pump, 3 phase, 3TF230/400 V. 50 Hz,265/460 V. 60 Hz
PKD45642 - DUO 35, Rotary vane pump, 3 phase, 3 TF200/346V, 50Hz,220/380V, 60Hz
PKT01300 - MVP 055-3, Diaphragm pump, 90-126 / 180-254 V, 50/60 Hz
PKT10800 - UniDryTM 050-3, for light duty processes, standard motor IP 54, 230/400 V, 50 Hz
PKT10801 - UniDryTM 050-3, for light duty processes, standard motor IP 54, 120/208 V, 60 Hz
Click to enlarge
TMH 1600 MPCH:
TMH 1600 MPCH, Turbomolecular drag pump, DN 250 ISO-K
Characteristics: TMH 1600 MPCH Pumping speed: for N2 1400 l/s, Ultimate pressure with rotary vane pump < 1·10-8 mbar, Gas throughput for N2 20 mbar l/s Temperature Management System (TMS) no, Venting valve integrated, Final pressure only attainable with metallic seals on high vacuum flange. Final pressure with elastomer seals (standard), < 1·10-8 mbar. The gas throughput is measured at HV-pressure of 0.1 mbar. Cooling water quantity is measured at max. gas throughput. REQUIRED BACKING PUMPS FOR CORROSIVE GASES ACCORDING TO APPLICATIONS ON REQUEST. Turbopump with high gas throughputs at economical fore-vacuum. Magnetic bearing turbomolecular pumps for corrosive gas operation offers hydrocarbon and maintenance-free operations with unlimited installation orientation. High gas throughput even with smallest backing pump volume flow rates.
Flanges: FlangesFlange (in): DN 250 ISO-K
Flange (out): DN 40 ISO-KF
Areas of Applications: - Thin film technology
- Tool coating
- Optical coatings
- Semiconductor technology
- Defect analysis
- Ion implantation
- Sputtering
- Plasma coating
- Vacuum process technology
- Research, Development and Scientific
- Plasma physics
Similar Products: Suitable backing pumps:
PKD45602 - DUO 35, Rotary vane pump, 3 phase, 3TF230/400 V. 50 Hz,265/460 V. 60 Hz
PKD45642 - DUO 35, Rotary vane pump, 3 phase, 3 TF200/346V, 50Hz,220/380V, 60Hz
PKT10800 - UniDryTM 050-3, for light duty processes, standard motor IP 54, 230/400 V, 50 Hz
PKT10801 - UniDryTM 050-3, for light duty processes, standard motor IP 54, 120/208 V, 60 Hz
PKT10804 - UniDryTM 050-3, for medium duty processes, standard motor IP 54, 230/400 V, 50 Hz
PKT10805 - UniDryTM 050-3, for medium duty processes, standard motor IP 54, 120/208 V, 60 Hz |